I've been reading on a website called wikichip that 10nm would be the last non EUV process for companies such as Samsung. I assume this means 10nm or above generally uses the DUV process instead?
Does this also mean that Intel's 10nm fab process will be less advanced, and (potentially) have lower transistor density than fab processes like TSMC's 5nm EUV process, due to having fewer layers in the CPU die material?
If this is the case, I wonder if this explains Intel's desire to move on from their 10nm fab. process, to 7nm (apparently EUV), even after the many years they've spent developing the fab process technology for desktop 10nm chips (likely in 2022).
Does this also mean that Intel's 10nm fab process will be less advanced, and (potentially) have lower transistor density than fab processes like TSMC's 5nm EUV process, due to having fewer layers in the CPU die material?
If this is the case, I wonder if this explains Intel's desire to move on from their 10nm fab. process, to 7nm (apparently EUV), even after the many years they've spent developing the fab process technology for desktop 10nm chips (likely in 2022).
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