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video clip that might intrest some of you

nice link and info

snip

To build next-generation transistors, Intel is working with new materials that show promise for replacing the silicon dioxide gate dielectric—where continued thinning makes it increasingly difficult to control current leakage. This thicker class of materials, known as "high-k," will replace today's silicon dioxide technology and then provide extendibility over several generations.
 
er.. isn't this old news about the high-k, or are they applying that tech to another area of the chip?

Matthew
 
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