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http://enthusiast.hardocp.com/article.html?art=MTI2OCwxLCxoZW50aHVzaWFzdA==Aside from the simple fact that the new 45nm process will allow for double transistor density over current generation processors, Intel also promises that the new microarchitecture will offer a significant performance-per-watt increase over current 65nm technology. Other benefits of the new 45nmm process and high-k and metal gate combination will be:
* Significant reduction in transistor switching power
* Improvement in transistor switching speed
* Reduction in source-drain leakage power
* Reduction in gate oxide leakage power
* Greater energy efficiency